If you liked Advances in Chemical-Mechanical Polishing by Duane S. Boning, Johann W. Bartha, Ara Philipossian, Greg Shinn, and Ingrid Vos, start with Machine Learning in VLSI Computer-Aided Design (2019), Chemical-Mechanical Planarization (2003), and The essential guide to mobile business (2002). These recommendations are drawn from the same author, shared genres, and reader overlap on BookOrb.

Back to Advances in Chemical-Mechanical Polishing · Duane S. Boning books in order

Recommended next reads

  1. 1 Machine Learning in VLSI Computer-Aided Design 2019 · 694 pages · Ibrahim (Abe) M. Elfadel, Duane S. Boning · Same author
  2. 2 Chemical-Mechanical Planarization 2003 · 348 pages · Michael R. Oliver, Duane S. Boning, Ingrid Vos · Same author
  3. 3 The essential guide to mobile business 2002 · 279 pages · Ingrid Vos, Pieter deKlein · Same author
  4. 4 Advances and Challenges in Chemical Mechanical Planarization 2014 · 388 pages · Gerfried Zwicker, Christopher Borst, Laertis Economikos, Ara Philipossian · Same author

Frequently asked questions

What should I read after Advances in Chemical-Mechanical Polishing?

BookOrb recommends Machine Learning in VLSI Computer-Aided Design (2019), Chemical-Mechanical Planarization (2003), The essential guide to mobile business (2002), and Advances and Challenges in Chemical Mechanical Planarization (2014).

Are there books like Advances in Chemical-Mechanical Polishing?

Yes. The list on this page is ranked from the closest matches BookOrb has for Advances in Chemical-Mechanical Polishing.

Who wrote Advances in Chemical-Mechanical Polishing?

Advances in Chemical-Mechanical Polishing is by Duane S. Boning, Johann W. Bartha, Ara Philipossian, Greg Shinn, and Ingrid Vos.